- Top page >
- Product information Top >
- Classification by category >
- DENKA L-MION
DENKA L-MION
Ion source for focused-ion beam (FIB) equipment
![]() ![]() ![]() |
Contact to this product from here |
| preceding page |
Outline
The Ga ion source "L-MION" achieves stable ion emission using a special chip processing.
Characteristics
Since special finishing of tungsten needle provides excellent gallium wettability, stable transportation of liquid gallium makes stable ion emission.
Applications
Cross-sectional observation of semiconductor devices, machining of magnetic disk heads, cross-sectional specimen preparation for TEM
Detailed data
- DENKA TFE Product Datasheet (JAPANESE ONLY) (39KB)
- DENKA TFE for SEM and TEM Datasheet (JAPANESE ONLY) (31KB)
- DENKA L-MION Product Datasheet (JAPANESE ONLY) (25KB)
Contact
- Division
- Functional Materials Department, Electronic Materials Division
- Section
- Heat-Dissipating Materials and Emitter G
- TEL
- +81-3-5290-5539
- FAX
- +81-3-5290-5078




